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Nanotechnology Breakthrough in Photoresist Self-Assembly Redux

March 24, 2010 by AboutNanoWires.com

Nanotechnology Breakthrough in Photoresist Self-Assembly Redux
Since 2007 the ITRS Roadmap has identified the directed assembly of block copolymers as a signpost on the path towards reducing feature size in chips.

Read more on IEEE Spectrum

Filed Under: General Nanotechnology News
Tagged: Block Copolymers, Breakthrough, Chips, Feature Size, Itrs Roadmap, Nanotechnology, Photoresist, Redux, Self Assembly, SelfAssembly, Signpost, Spectrum

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